ASML EXE 5000 Wilton, CT
Description
Design-build of a 30,000 sf Semiconductor Capital Equipment manufacturing building and cleanroom. The 26,000 sf, ISO 6 cleanroom had a 24-ft ceiling, 4-ft depressed slab, and raised access floor. HC handled all aspects of construction, including site work, stabilization with rock piles, foundations, steel, metal wall panels, and TPO roofing. The cleanroom featured walkable Power T 2″ grid, 4×4 fan filters, new units for cooling, chillers, and exhaust fans. HC installed a 10 MW power service, process cooling water, CDA, RO/DI piping, N2, LN2, and specialty gases, along with two 20-ton cleanroom bridge cranes. The project was completed 3 months ahead of schedule, within 16 months.
Industry
Microelectronics / Semiconductor
Project Delivery
Design Build
ISO Class
ISO 3, 4
Similar Projects
University of Arizona
Completed in 2026, Hodess provided design assist services for The University of Arizona Nano Fab Expansion project. Located in the Electrical and Computer Engineering…